Enabled Scaling Capability with Self-aligned Multiple patterning process
نویسندگان
چکیده
منابع مشابه
Enabled Scaling Capability with Self-aligned Multiple patterning process
Optical projection technique has been driving the lithographic scaling with unceasing evolution of wave length (λ) and numerical aperture (NA) historically. Although the delay of EUV (Extreme Ultra Violet) tool for HVM (High Volume Manufacturing) is concerned, down-scaling proceeds unceasingly with the extension approach of 193 immersion. One of most promising technique for extension of 193nm w...
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ژورنال
عنوان ژورنال: Journal of Photopolymer Science and Technology
سال: 2014
ISSN: 0914-9244,1349-6336
DOI: 10.2494/photopolymer.27.491